Research Institute for Semiconductor Engineering

The super clean room

cleanroom

The super clean room, installed in the west building in 1989 and in the east building in 1999, covers an area of 864 m2. The cleanliness of the cleanest section is Class 10 (less than 10 particles of 0.5 μm or greater in 1 cubic foot)," making it one of the few facilities in Japan for education and research where semiconductor device design, fabrication, and evaluation can be performed consistently under the highest level of environment.

cleanroom
cleanroom

cleanroom
cleanroom
cleanroom